Used AMAT / APPLIED MATERIALS 0100-09153 #293658872 for sale

AMAT / APPLIED MATERIALS 0100-09153 Reactor is a equipment designed to perform advanced and high-precision poiy-silicon etch processes. This system is composed of two chambers: the deposition chamber and the etch chamber. The deposition chamber is a closed-loop type vacuum chamber which is capable of supporting vacuum processes. This chamber is equipped with various components which support the process of introducing low pressures, controlling the vacuum, monitoring the unit's temperature and providing filtration. The etch chamber serves as the main processing chamber of the machine and is where the etching processes take place. This chamber is also equipped with similar components of the deposition chamber, which helps to optimize the etching process. The PMTAMAT 0100-09153 reactor is equipped with an E-beam source and ion implanter which are used for the etching process. First, a low-pressure ionized gas is introduced into the etch chamber and it is then heated up in order to raise the temperature of the processed substrate. This facilitates the introduction of the reactive species, which induces chemical reaction with the substrate, allowing for precise etching. The E-beam source serves to aid in the etching process by controlling the direction of the etching reaction. Finally, the ions are implanted onto the substrate in order to manipulate the size and structure of the substrate's crystals. The PMT APPLIED MATERIALS 0100-09153 reactor is a sophisticated tool which is capable of performing a wide range of etching processes. Through its ability to control the etching process with precision, this asset serves as a useful tool in the development of thin film silicon structures. It is capable of producing materials with excellent crystalline characteristics and distinct electrical properties. Moreover, it is well suited to the etching and fabrication of various components used in the microelectronics industry.