Used AMAT / APPLIED MATERIALS 0100-20063 #293659251 for sale

AMAT / APPLIED MATERIALS 0100-20063 is an industrial reactor that is designed to handle a variety of processes in semiconductor and thin film deposition. This high-end deposition chamber, based on hot-wall technology, is designed to form continuous and uniform films on large substrates at high deposition rates. This reactor utilizes a horizontal and vertical configuration with a multiple socket design for various susceptor design. AMAT 0100-20063 is designed with a 5-wafer hot-wall and hot-stripper, enabling a variety of processes such as catalyst and metal evaporation, low pressure chemical vapor deposition (LPCVD), plasma enhanced chemical vapor deposition (PECVD), and atomic layer deposition (ALD). This reactor is capable of handling all kinds of applications including reactant heating, crystal growth, film deposition, sputtering, and etching. This deposition chamber utilizes a double wall structure that has an outside wall of 316L stainless steel and an interior wall of zirconium oxide at the top and magnesium oxide at the bottom for superior thermal insulation and mechanical support. Additionally, it features an embedded temperature probe that allows for optimal temperature readout and uniform deposition. The reactor is designed with a helical impedance heating element, that provides a clearly defined temperature profile for uniform and full film formation. This system allows for temperature precision and accuracy within +/- 2°C. All components are designed for exceptional life and reliability; and as such it has a long term stability of +/- 0.03°C per hour. APPLIED MATERIALS 0100-20063 is designed with a pressure differential sensor as well as a cycle manometer. It also has a gas flow-meter that provides precise control of the reactant gases within the system. The integrated and optimized deposition components within the chamber enable consistent film formation and process reproducibility. This chamber is equipped with a built-in ion source for film smoothing which allows for increased uniformity and film surface integrity while reducing particulate contaminants within the chamber. Additionally, an optional remote control interface allows for sophisticated temperature curve programming and efficient gain of production. 0100-20063 is a versatile and reliable reactor that provides superior thermal insulation and mechanical stability for various deposition processes. This high-end deposition chamber enables continuous and uniform films, while providing superior temperature precision for reliable and repeatable process control.