Used AMAT / APPLIED MATERIALS 0100-35053 #293666633 for sale

AMAT / APPLIED MATERIALS 0100-35053 is a reactor used in a CVD (Chemical Vapor Deposition) process. The reactor consists of an annular chamber with four RF (radio frequency) electrodes. The electrodes are designed for a DC (Direct Current) bias when operated at high pressures; this is done to control the ionization of the process gas. The chamber is designed for uniform gas distribution and pressure control. All edges of the interior chamber walls are designed to provide an even gas flow. The interior of the chamber is also designed to ensure a uniform and efficient reaction. The four RF electrodes also serve to control the pressurization and uniformity of the gas flow. AMAT 0100-35053 is capable of producing precise results at room temperature with no need for cooling. The CVD process allows for high deposition rates with precise control over the temperature of the process gases, allowing for high deposition rates. APPLIED MATERIALS 0100-35053 is not only capable of higher deposition rates, but also very precise control over the process. It is designed to help maintain a consistent temperature in the chamber, even when changes are made in temperature due to changes in the process gas flow, pressure distinctions, or gas composition. The uniformity of the CVD process helps to ensure a homogeneous film deposition. 0100-35053 is designed for high levels of accuracy and repeatability, which are critical components in CVD film deposition processes. This design includes temperature control systems to prevent undesired over- and under-heating, as well as the maintenance of atmosphere balance. AMAT / APPLIED MATERIALS 0100-35053 is designed for use in the deposition of both metallic and dielectric films. This broad range of materials allows for the deposition of many different kinds of films with significant precision. Additionally, the use of the CVD process ensures a very uniform film thickness on the substrate, which is crucial for the production of thin-film devices. AMAT 0100-35053 is an effective CVD reactor with features that make it an industry leader in film production. Its uniform temperatures and pressure control, precision temperature systems, and broad range of materials ensure it's an effective choice for clean and consistent film deposition.