Used AMAT / APPLIED MATERIALS 02-0331340-1031109-001 #293676287 for sale

AMAT / APPLIED MATERIALS 02-0331340-1031109-001 is a type of reactor designed for the deposition of gas-phase materials onto substrates. It is used in a variety of industries, including the semiconductor, solar, magnetics, and graphene industries. AMAT 02-0331340-1031109-001 reactor's design consists of a rectangular tube-like chamber that is enclosed by a vacuum-tight window and sealed with O-rings. The chamber houses a series of metal electrodes which are connected to an external power source and contain ports to introduce gases into the chamber. These electrodes generate a low-pressure plasma which provides an environment in which gas-phase materials can be deposited onto a substrate at a precise rate. The device also includes a controller that allows users to program specific deposition parameters such as gas pressure, plasma power, and deposition rate. APPLIED MATERIALS 02-0331340-1031109-001 reactor is highly efficient, with an optimal deposition rate of ~2.8 nm/min and a broad range of operating temperatures between -40°C and 200°C. The substrate size is limited to 6" x 6" in dimension and has a maximum temperature rating of 600°C. The device is highly reliable and is capable of producing high quality results, in both single-wafer and multi-wafer operations. Its design also ensures that the process parameters remain stable, meaning that users can consistently achieve the desired results. 02-0331340-1031109-001 reactor is an invaluable tool for the deposition of gas-phase materials onto substrates. It features a proven design, allowing users to achieve precise and repeatable results with minimal effort. With its wide range of operating temperatures and substrate sizes, the device is suitable for a number of industries and can be used to create repeatable, high-quality results. AMAT / APPLIED MATERIALS 02-0331340-1031109-001 reactor is an essential piece of laboratory equipment for any researcher or engineer.