Used AMAT / APPLIED MATERIALS 0290-20094 #9173620 for sale

AMAT / APPLIED MATERIALS 0290-20094 reactor is an innovative and advanced tool used in semiconductor processing. Due to its unique design, AMAT 0290-20094 reactor offers an improved ability to perform high quality processes which can be tuned to optimize device performance. It is a high-temperature chemical vapor deposition (CVD) tool which consists of a computer-controlled two-chamber design. The first chamber holds a substrate such as silicon wafers and is equipped with a high temperature hot-wall reactor. The second chamber housed a gas box containing raw material gases, such as silane and ammonia, used to deposit the thin film material on the substrate. APPLIED MATERIALS 0290-20094 reactor utilizes a low pressure CVD process which ensures superior uniformity on both sides of the substrate. The process is extremely accurate and repeatable due to the Hot Wall CVD reactor and its uniform heat transfer to the substrate. Moreover, 0290-20094 reactor facilitates the incorporation of automated wafer handling and programming for automated CVD operations which considerably ease the processing. It also offers process monitoring which can be set up to optimize temperature, gas flow rates, and deposition rate of the film. Overall, AMAT / APPLIED MATERIALS 0290-20094 reactor is a highly versatile CVD tool which is increasingly becoming popular due to its powerful performance characteristics. With its advanced design features, the reactor offers superior film deposition control and high process consistency which is essential for the manufacture of high performance devices. AMAT 0290-20094 reactor is a reliable and efficient tool which can be used with various substrates and gases to facilitate complex processes and deliver superior results.