Used AMAT / APPLIED MATERIALS 1600 #293620425 for sale

AMAT / APPLIED MATERIALS / AKT 1600 is a single wafer reactor designed for high throughput production of various semiconductor components, such as modern wafers and substrates. This multi-use reactor was designed to process singulated, non-okloaded wafers up to 6 inch diameter. The reactor is designed to accept two individual cassettes, allowing two separate processes to be run simultaneously. The reactors' sophisticated process chamber design permits uniform distribution of multi-dimensional, high-density plasma (HDP). This specialized chamber also yields repeatable and highly reliable, high-yield results on a repeatable cycle time. AKT 1600 is equipped with a multi-nozzle showerhead, which ensures dielectric uniformity on the rates of all of the substrates. The reactor chamber is fitted with a gas-flow manifold and a digital oxygen gauge. This feature provides optimal control over the specific process needs of each process. The reactor is designed to be operated in a dry environment, allowing for a clean process environment. A mini-sensor and valved turbo pump provides each process with the correct amount of process gas, adding to the reactors dependable, repeatable performance. The processor is further equipped with a depth adjustable boat elevation system ensuring optimal deposition uniformity with non-loaded wafers. AMAT AKT1600 comes with a Touch Screen user interface which allows for quick changes and easy monitoring of process parameters and recipes. The process monitor and control system helps to minimize downtime and maximizes the yield of each process. With this systems reliability and repeatability, AMAT / APPLIED MATERIALS / AKT AKT1600 is a great option for high-throughput production of semiconductor components.