Used AMAT / APPLIED MATERIALS 1600 #9364083 for sale

AKT/AMAT / APPLIED MATERIALS / AKT 1600 reactor is a plasma etch, deposition, and annealing equipment used in materials processing applications. With its advanced nanotechnology capabilities, this reactor is used for R&D projects involving the deposition and etching of thin films. AKT 1600 utilizes an inductively coupled plasma (ICP) source which generates high temperatures, energetic ions, and other species which can be used to etch a wide variety of materials. This ICP source is fed by a high frequency RF power supply, which can be adjusted to adjust the power delivered to the plasma. AMAT AKT1600 is capable of working with high temperatures, ranging between 75 to 1,200 degrees Celsius. APPLIED MATERIALS 1600 is a dual chamber, horizontally configured reactor with a load lock chamber. The load-lock chamber serves to transport wafer carriers between the two chambers without exposing the chamber or apparatus to outside contamination. This prevents any air or other contaminants from entering the processing chamber. AMAT 1600 is capable of depositing a variety of films such as metals, polymers, and dielectrics. This is achieved through a gas injection system that brings gas into the unit, in combination with the source power of the ICP machine, which can modify the density of the deposited material. An advanced heating element producing a directed line of sight (DLOS) allows for annealing of deposited films or other materials in the chamber and can be set for times between five minutes to several hours. 1600 is capable of controlling the process rates and composition in real time, which allows them to be precise. This accuracy, combined with the advanced heating elements, allows for good process repeatability and reliability. The tool is also equipped with a large variety of diagnostic capabilities, such as camera imaging and infrared imaging. Overall, AMAT/AKT AKT1600 reactor is an advanced tool used for materials processing applications. It is capable of producing precise etching, deposition, and annealing results with its ICP asset and DLOS heating capabilities. These features give it the ability to produce strong structures with repeatable results, ensuring quality and reliability for its end products.