Used AMAT / APPLIED MATERIALS (3) Chambers for P5000 #293636202 for sale

AMAT (3) Chambers for the P5000 Reactor is a high-performance, three-chamber, advanced process tool dedicated to chip-level manufacturing. This equipment offers increased throughput and fast cycle times with the highest quality to meet the most demanding customer requirements. This P5000 Reactor provides unique features and capabilities that set it apart from competitive systems. The most impressive of these is the advanced multi-stage system for rapid and repeatable processes. The three chambers can be configured for etching and deposition, with additional processes such as sputter deposition, additional external processing capability, and advanced cooling systems available. By combining hardware and software innovations, the unit delivers maximum throughput and throughput management, resulting in process optimization. The workflow of the P5000 is designed to yield repeatable, high-quality results with consistently predictable cycle times. The process integrates the chamber modules and sequences vacuum cycles, temperature control, remote table handling, and sensing with the process programming. It also offers automatic selective repeat, which allows the user to run multiple identical recipes with varying parameters. The P5000 boasts best-in-class chamber temperatures, pressure control, and uniformity. Chamber temperature control is implemented through an advanced PID 18-zone temperature control machine, while the pressure control offers stable and repeatable pressure profiles over a wide range of pressure levels. Additionally, the tool includes a unique thermal mapping feature for the etch and deposition chambers, which allows for better process control and repeatability of critical wafer-level parameters across the entire wafer. This thermal mapping feature also offers faster cycle times and increased process margin. The P5000 also includes additional features such as a precision wafer handling and placement asset, automatic loading/unloading with random access, real-time target layer monitoring, and advanced process monitoring. Additionally, the model has advance diagnostics and fault verification for improved process yields and reliability, plus advanced data acquisition and retrieval capabilities for further process optimization. Overall, APPLIED MATERIALS (3) Chambers for the P5000 Reactor is a high-performance, three-chamber tool that provides increased throughput and fast cycle times with the highest quality, while offering best-in-class chamber temperatures and consistent process margins. With its unique thermal mapping feature, the equipment helps maximize process yields and reliability. This reactor also has the flexibility to support multiple configurations, providing the user with ultimate control and repeatability for their process.