Used AMAT / APPLIED MATERIALS (3) CVD Chambers for P5000 #293660269 for sale

AMAT (3) CVD Chambers for P5000 enables chemical vapor deposition (CVD), enabling users to create thin surface films for various uses. This CVD reactor features three chambers with individualized deposition zones and is suitable for use in the deposition of metals, oxides, nitrides and other materials. The P5000 successfully combines several technologies for the etching and CVD processes in a single system, designed to improve throughput and productivity. APPLIED MATERIALS (3) CVD Chambers for P5000 has three deposition chambers: a low temperature deposition chamber, a high temperature deposition chamber, and a plasma-enhanced deposition chamber. The low temperature chamber is equipped with a heated wafer transport system, enabling a temperature range of 20-200°C for the deposition of materials deposited from liquid and solid sources. The high temperature chamber allows for deposition at temperatures up to 1000°C, enabling deposition of a wide variety of materials, such as metals, nitrides, oxides, alloys, and polymers. The third chamber is a plasma-enhanced deposition chamber, which utilizes plasma-induced gas phase deposition processes for materials that cannot be successfully deposited from a liquid or solid source. The three chambers are each outfitted with their own individualized RF power sources, which allow for easier optimization of processes. The advanced software and database of wafer overlay and alignment recipes help assure users the highest level of process control. All of the user-friendly measurement and analytical features minimize process time and enable the user to accurately control substrate temperatures and deposition rates. AMAT / APPLIED MATERIALS (3) CVD Chambers for P5000 support a variety of materials and process types, allowing for a range of product possibilities. This CVD reactor also provides users with multi-zone continuous processes, which help create more complex film structures and other structures, such as nano-scale features. The chamber also includes standard safety features, ensuring that operators are adequately safeguarded during operation. AMAT (3) CVD Chambers for P5000 offers an advanced CVD technology package in which users can deposit a variety of materials on different substrates. This advanced CVD reactor provides users with high productivity, flexibility, and ease-of-use, all while remaining cost-effective. All of these features combine to make the P5000 an excellent choice for any business in need of a reliable and efficient CVD reactor.