Used AMAT / APPLIED MATERIALS 3500 #9380503 for sale
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AMAT / APPLIED MATERIALS / AKT 3500 is a multi-chamber plasma etch reactor designed to enable precise etching of devices in a wide range of applications. With a range of process chambers ranging in size from 10" to 20", there is a potential to etch devices up to a maximum chamber size of 19". It provides both reactive plasma etch and dry etch capabilities in the same reactor. AKT 3500 reactor utilizes various process gases depending on the etch application, including chlorine, bromine, fluorine, argon, nitrogen, oxygen, silane and sulfur hexafluoride. It also utilizes direct current (DC) power supplies for generating the plasma and various magnetic fields, and inductively coupled plasma sources for delivering the required energy input. The plasma is used to strip away unwanted layers of materials or to etch deeper into the material of a device. Depending on the etch application, AMAT AKT-3500 can be used with various reactor setups including single, triple and quad chambers. The single chamber etch process involves a single separate source of the required process gas, while the triple and quad chambers can simultaneously utilize multiple gas sources. Each chamber of APPLIED MATERIALS 3500 is also equipped with multiple electrostatic and static gas-sampling lines, to ensure that an even, uniform etch of the device. AKT AKT-3500 reactor is also equipped with a range of safety features including fire and gas shut-off systems, as well as emergency filters and venting systems. Additionally, the system includes temperature regulation and an active monitoring system, to ensure that the process is always operating within the desired parameters. AKT-3500 provides reliable and efficient etch results for a variety of application requirements. It can be used for precise etching on medium and large area devices, as well as for deep etching on small area devices. With components that assist in uniform etching, this reactor offers scalability to meet the demands of various industries.
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