Used AMAT / APPLIED MATERIALS 3500 #9380504 for sale

ID: 9380504
PECVD System.
AKT/AMAT / APPLIED MATERIALS / AKT 3500 is a reactor designed to perform a variety of processes in the semiconductor industry. It is equipped with high temperature and pressure capabilities that allow it to perform a multitude of etching and deposition tasks. The reactor is reliable, versatile, and safe to use, as it is equipped with a safety shut down feature. At its core, AKT 3500 features a thermally insulated, gas-tight pyrolytic-graphite chamber, which is designed to provide excellent thermal conductivity and resistive/regenerative properties during use. Additionally, the chamber is lined with composite film that contributes to superior temperature homogeneity. The reactor is heated using an advanced resistive heating equipment, which features an embedded temperature sensor system that regulates the rate of heat transfer and works to maintain accurate and consistent temperatures. AMAT AKT-3500 also features an integrated automated process control unit that helps to ensure reliable and repeatable results. This machine is designed to monitor the reactor's temperature and pressure settings and adjust them accordingly to maintain process accuracy. Additionally, the tool can be programmed for a wide range of processes and materials. AMAT / APPLIED MATERIALS / AKT AKT-3500 also includes an automated process monitoring asset, which records process parameters and assists in documenting results. This model also offers access to process monitoring and analysis capabilities. Moreover, the reactor is designed to incorporate a variety of options, such as custom configurations, to fulfill multiple process requirements. Examples of these configurations includeelectron cyclotron resonance microwave plasma (ECR), electrostatic, sputtering, and ion implantation. In this way, AKT-3500 can be tailored to meet the specific needs of various semiconductor production applications. Finally, APPLIED MATERIALS 3500 can be equipped with a high-speed RF power supply, along with an RF measurement equipment, in order to provide the highest possible yields during the various etch and deposition processes. In summary, AMAT/AKT AKT-3500 is an advanced, reliable, and versatile reactor that is designed to perform multiple processes in the semiconductor industry. It features a temperature-resistant chamber with superior temperature homogeneity, along with an automated process control system and process monitoring unit. Additionally, it can be customized for a variety of operations and is equipped with a high-speed RF power supply for the highest possible yields.
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