Used AMAT / APPLIED MATERIALS 3500 #9380514 for sale

AMAT / APPLIED MATERIALS / AKT 3500 is a type of chemical reactor developed by AKT Inc. It is an advanced Plasma Enhanced Chemical Vapor Deposition (PECVD) production equipment with low temperature plasmas. This type of deposition is used to deposit thin films of various materials, mostly silicon and nitrogen, on a substrate. AKT 3500 is a versatile, versatile, and scalable system that can be used to manufacture a wide variety of products including semiconductor components, displays, and optics. This reactor boasts a horizontal-mounted rectangular chamber for processing up to 8" X 8" substrates. The chamber has two sources of Dual Magnetron Sputter (DMS) and Multi-Source Magnetron sputter sources which can be used to generate the desired plasma environment. Additionally, the unit is capable of achieving substrate temperatures from 10°C to 200°C, allowing for precise control of the deposition process. The reactor is outfitted with a variety of advanced technologies designed to reduce cost and increase efficiency. In particular, the windowless vacuum chamber technology that is used in AMAT AKT-3500 helps to reduce thermal energy loss, thus decreasing overall energy consumption, as well as reduce particle contamination. An additional advanced technology, flexible gas distribution, allows precise control over the precursor gas flow rate, which aides in optimizing thin film processes. The machine uses a patented cathodic arc source technology, which results in high quality, uniform coatings with high deposition rates. This is due to the arc that is generated between the Anode and Cathode, resulting in high energy plasma capable of depositing thin films with no contaminants. This technology also offers a very-high uniformity in thin film deposition across the entire substrate. APPLIED MATERIALS AKT-3500 is an industry leading, customizable tool designed for high precision thin film deposition. It offers a wide range of features, technologies, and control methods which make it an ideal choice for many production applications. This state-of-the-art asset also eliminates many of the limitations of traditional PECVD systems, providing users with a much more efficient, cost-effective solution.