Used AMAT / APPLIED MATERIALS 3500 #9380519 for sale

AMAT / APPLIED MATERIALS / AKT 3500 is a reactor designed to be used in semiconductor fabrication operations. It is capable of creating advanced patterns on wafers and other substrates with minimal cost and maximum efficiency. AKT 3500 is an upgraded version of its predecessor, AKT 3000, and features a patented process that can deposit thin films onto substrates with more uniformity and precision than ever before, and deposit these films on materials like silicon, glass, and metal alloys. The reactor has a built-in chamber that is capable of vacuum levels as low as 10-6 torr and ultra-high vacuum levels up to 10-9 torr, allowing for accurate and precise plasma processing. There is also a range of optional accessories that can be added to the reactor, such as a load-lock system and high temperature zone ovens. AMAT AKT-3500 also features advanced programmable control systems that enable the user to program the reactor to specific parameters, and these parameters can be adjusted as needed. It also comes with the ability to monitor the deposition process in real time to ensure that the results are accurate and consistent. The process qualities of 3500 are quite remarkable. This reactor can be used to produce patterns with line widths as low as 10nm and can handle resolutions up to 25 nm. It also has the capability to create highly accurate, 3D shapes with a lot of precision. In addition, the reactor's high throughput and low processing time makes it very cost-effective. Overall, AKT AKT-3500 is an excellent reactor for creating advanced patterns and films on different substrates. Its high quality process, programmable control system, and low processing time make it an ideal tool for the semiconductor fabrication sector.