Used AMAT / APPLIED MATERIALS 3500 #9380521 for sale

AMAT / APPLIED MATERIALS / AKT 3500 is a single-wafer, low-pressure chemical vapor deposition (LPCVD) reactor designed and manufactured by AKT. This reactor is used to deposit multi-layer thin films of silicon oxides, nitrides, and other materials onto the surface of a silicon wafer. The equipment is composed of two major parts: a gas lines/valves component and a process chamber. The gas lines/valves component is comprised of critical sensors, valves, and controls to help manage the flow of process gases into the system. The process chamber, made of stainless steel, includes two electron-beam sources with independent power control, 1 RF power source, and temperature control for the entire chamber. AKT 3500 has a process chamber temperature range of 120°C - 900°C and is capable of operation at atmospheric or reduced pressures. It has a wafer size range of up to 8'' in diameter and its maximum process load is 7 lbs. The unit is further designed to handle specific deposition overhead and runs at a maximum of 80 W/in2. It has various data communication protocols such as Ethernet, RS-232, and RS-485 for remote access. AMAT AKT-3500 has a high-precision plasma cleaning feature that helps to separate and transport volatile particles in order to reduce process-induced contamination. It has been designed to follow JEDEC rules for producing a reliable and repeatable deposition process for high-performance applications such as DRAM, Flash memory, and Logic. The machine is also equipped with an extensive suite of safety features including interlocks, ground fault interrupts, and alarms. Overall, APPLIED MATERIALS 3500 is an advanced reactor designed to produce precise and consistent results. It has been rigorously tested and proven to perform optimally in production environments. Its features and modern design make it the ideal choice for applications requiring high-quality and reliable results.