Used AMAT / APPLIED MATERIALS 3500 #9380523 for sale
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AMAT / APPLIED MATERIALS / AKT 3500 reactor is a low-pressure, chemical vapor deposition (CVD) equipment designed for processing both patterned and unpatterned semiconductor wafers. The system is capable of depositing a wide variety of dopants and dielectrics on the wafer surface in order to enhance electrical and physical properties. The unit features a hot wall CVD chamber equipped with a Quartz Insertable Component (QIC) that permits rapid, controlled changes in process gas concentrations. This allows for versatile deposition of layers to suit a variety of different applications. AKT 3500 reactor also features a low turbulence environment that provides highly uniform and repeatable deposition prcesses. This is ideal for processing high-frequency and RF devices, as well as low temperature dielectrics. The machine is equipped with a temperature range of 50-800C, pressure range of 0.1-10 torr, and a gas handling tool with multiple process gas valves and mass flow controllers. The asset is capable of operating in 400mm wafer and 8-inch wafer configurations, and it can be equipped with an advanced temperature control package. AMAT AKT-3500 reactor is an easy to use and reliable model for process in a variety of semiconductor manufacturing applications. The equipment also features adjustable focus and open chamber design that helps reduce cross-contamination and prevent particle generation. The system is also equipped with a fast and reliable Open-Loop Stepper/Scanner, allowing for high throughput processing. The unit offers simple wafer control options, allowing for multiple wafer recipes to be run simultaneously. AMAT / APPLIED MATERIALS / AKT AKT-3500 reactor is an ideal tool for depositing dopants, dielectrics, and other materials on semiconductor wafers. Its advanced features and robust design make it an ideal choice for semiconductor processing. The machine is reliable, repeatable, and easy to use, making it suitable for a variety of different semiconductor applications.
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