Used AMAT / APPLIED MATERIALS (4) AE Minos chamber for Centura DPS II #293667189 for sale

AMAT / APPLIED MATERIALS (4) AE Minos chamber for Centura DPS II
ID: 293667189
Wafer Size: 12"
12".
AMAT (4) AE Minos chamber for Centura DPS II is a purpose-built reactor which offers superior performance and reliability for a variety of deposition processes. The AE Minos is the ideal system for applications such as dielectric thin film, metal deposition and other proven low-pressure chemical vapor deposition techniques deployed in integrated circuit production. It is an easy to use system, with up-to-date software, efficient operation, and time-saving automation technologies. The reactor combines pre-programmed scripts and "Set and Forget" recipe execution to ensure consistent, repeatable results. The AE Minos has a large process area with a diameter of up to 40 cm, designed to process larger wafers and maximize production throughput. Its integrated process chamber allows the user to couple one source with up to four additional sources for ultimate flexibility while maintaining quality product, and is equipped with a fast-acting PID controller to maintain the process within a tolerance of ±2°C. It also comes with advanced active exhaust management capabilities, providing exceptionally low emission rates into the external environment. The AE Minos is easy to configure and maintain, with a touchscreen control and USB interface. Its advanced robotics-controlled wafer carousel allows for low-level human intervention, and automated mis-run detection maximizes yield and eliminates errors associated with manual operation. The design ensures maintenance free performance, and a range of safety features ensures an operating environment free from risk to personnel and the process chamber itself. Its compatibility with Centura DPS II ensures an efficient integration into existing manufacturing environments. The AE Minos is a reliable, easy-to-use reactor for integrated circuit production, offering exceptional performance, reliability, and throughput. Its purpose-built design, with advanced PID controls, active exhaust management capabilities, and intuitive touchscreen controls make it an ideal system for semiconductor deposition processes.
There are no reviews yet