Used AMAT / APPLIED MATERIALS 60KO #9226836 for sale

ID: 9226836
Vintage: 2007
PECVD System Gen 8.5 Maximum substrate size: 2200 mm x 2600 mm (7) Process chambers with TSLL Suitable for HIT/HJT cells application 2007 vintage.
AMAT / APPLIED MATERIALS / AKT 60KO is a specialized vacuum deposition/reactive sputtering equipment designed for the production of advanced materials and coatings for semiconductor and microelectronic technologies. This system is built for precise control of the deposition reactions in order to produce high-quality, high-yield, and repeatable results. AKT 60KO is a high-performance, PVD (physical vapor deposition) deposition unit. The machine consists of a sputter deposition source with adjustable mass flow controllers to precisely control the gas flow rates. A recirculating gas filtration tool is also provided to ensure a clean gas supply. This asset also features an adjustable high vacuum turbulence suppression model, which is a critical element for achieving high-quality target material deposition and low gas-phase impurities. AMAT 60KO is designed for the deposition of a wide range of material, including metal, ceramic, and diamond-like carbon. It can also be used for reactive sputtering, allowing a wide range of materials to be deposited onto substrates. An adjustable source powering equipment is provided for precise control of the deposition rate. This system also includes an optional reactive gas source, which is used to maintain a clean deposition chamber during the sputtering process. The deposition chamber itself is designed to maintain a high level of chamber cleanliness. The interior is made of stainless steel and lined with durable ceramic tiles. An adjustable gas injection unit allows for precise control of the flow of reactive or non-reactive gases. The chamber can also be equipped with an optional in-situ substrate cooling machine to improve the quality of the deposited film. 60KO also includes an advanced software interface which allows the user to adjust the deposition process for specific needs. It is also possible to program custom recipes for depositions. This tool also has an automatic end-point detection capability for easy monitoring of the deposition process. Overall, APPLIED MATERIALS 60KO is an advanced, high-performance PVD/sputtering asset designed for the production of advanced materials and coatings for semiconductor and microelectronics technologies. It features a range of features allowing for precise control of the deposition process, an adjustable high vacuum turbulence suppression model, as well as an advanced user interface. The equipment is designed to provide high-quality, repeatable results with exceptionally low gas-phase impurities.
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