Used AMAT / APPLIED MATERIALS 7700 #9095979 for sale

AMAT / APPLIED MATERIALS 7700 is a reactor designed for semiconductor plasma processes. AMAT 7700 utilizes AMAT patented HiCap Power and Multimode sources to provide the highest level of uniformity and plasma etch rate across wafer substrates. APPLIED MATERIALS 7700's unique crossover feature allows for uninterrupted transitions between the two power sources, resulting in a seamless process cycle and excellent process stability. 7700 is capable of handling processes such as etching, oxide deposition, nitride deposition, and condensation. Its broad range of chamber sizes and materials make it suitable for a wide variety of applications. The source chamber also features enhanced uniformity control for high-fidelity plasma processing and the most efficient and effective plasma etching process for low-K deposition. AMAT / APPLIED MATERIALS 7700 is outfitted with high-power RF amplifiers that ensure stable and reliable plasma generation and control. It also utilizes advanced plasma monitoring systems to maintain a precise balance between plasma density and etch rate for superior process control. AMAT 7700's superior performance is complemented by its advanced diagnostics and diagnostics analysis capabilities. With in situ diagnostics analysis, the user can track plasma species, ion energy distributions, and process times with precision. In addition, the advanced optical emission spectroscopy diagnostics can quickly analyze the presence of impurities in the plasma, allowing for faster process optimization. APPLIED MATERIALS 7700's durability and safety features also ensure a safe and efficient processing environment. Its advanced safety/failure/quench features protect the chamber from high temperature cycling and potential arcs, with an emergency shutdown system that safeguards the system against unexpected damage. All in all, 7700 reactor is a powerful and reliable tool for semiconductor plasma processing. Its powerful source and RF amplifiers coupled with its advanced optical emission spectroscopy diagnostics capabilities provide the highest level of etch rate, uniformity, and accuracy in the industry. Moreover, its unique crossover feature and process safety features make it ideal for any etch, deposition, or condensation process.