Used AMAT / APPLIED MATERIALS 7710 #9095868 for sale

AMAT / APPLIED MATERIALS 7710 Reactor is a next generation TFE (Three-Field Etch) system designed for etching advanced semiconductor device structures with high accuracy and superb uniformity. This state-of-the-art system is capable of etching through field oxide layers, resist layers, film stacks, and other device structures. AMAT 7710 utilizes an advanced TFE process to achieve near-perfect uniformity in a variety of device structures. At the heart of APPLIED MATERIALS 7710's capabilities is its advanced TFE process. TFE is designed to provide device structures with higher dimensional accuracy and superior uniformity when compared to traditional dry etch processes. 7710 uses an innovative three-field etch chamber design that utilizes two source gases, and a third "bias" field to create a unique etch environment. The source and bias gases are actively controlled in order to produce the optimal etching conditions for the particular device structure. This advanced technology helps to ensure uniform etch depths as well as tight feature sizes. AMAT / APPLIED MATERIALS 7710 features a novel pre-conditioning stage. Silicon wafers are exposed to a specialized low damage dry etch process, to ensure the dielectric layers and other delicate components are prepared before etching. This pre-conditioning step enables a controlled etch process that optimally prepares the device structure before the etch process begins. In addition to its advanced pre-conditioning step, AMAT 7710 also uses an array of gas plenum assemblies and intricate vacuum systems to manage the etching environment. Each type of device structure requires different etch conditions, as such APPLIED MATERIALS 7710 is capable of automatically adjusting the etch process parameters to provide the best etching performance. 7710 is an ideal choice for any customer seeking to optimize the etching process of advanced semiconductor device structures. With its advanced TFE process, AMAT / APPLIED MATERIALS 7710 offers superb uniformity and tight feature sizes for improved performance and yields. As well as its pre-conditioning step, intricate gas plenum assemblies, and managed vacuum systems, AMAT 7710 is a state-of-the-art choice for etching device structures.