Used AMAT / APPLIED MATERIALS 7710A #9095861 for sale

AMAT / APPLIED MATERIALS 7710A is an advanced, high-performance chemical vapor deposition (CVD) reactor used in the deposition of atomic layer materials such as thin-films, dielectrics, oxides and nitrides. This tool is widely employed in the semiconductor industry for the growth of materials on the micro and nanoscale. AMAT 7710A reactor is a two-chamber, horizontal CVD system designed for automated fixturing and wafer transfer between chambers without breaking vacuum. It has a robust stainless steel inner chamber with Pyrolytic Carbon liner, Tubular electrodes, and a ceramic heater tube to provide a high-purity, ultra-low-temperature, and high temperature CVD process. The Wafer Plate-in-Range allows for the use of three wafer diameters ranging from 30 mm to 125 mm, as well as thick process wafers up to 1.2 mm and thin film substrates up to 0.300 mm. APPLIED MATERIALS 7710A has a powerful mass flow controller which allows for precise control of process gases from 10ccm to 1800ccm range and dual crystal quartz windows for perfect detector viewing and monitoring during the deposition process. A heated chamber perimeter provides uniform temperature control across the wafer resulting in a low defectivity, precision process. This reactor also incorporates a temperature-based gas switching which offers superior stress control due to better wafer thermal management for thin film applications. 7710A is a fully automated CVD system with programmable recipe software. This reactor incorporates a temperature range as low as 200℃ and up to 900℃ and is capable of operating at high pressure up to 10Torr. It provides excellent thermal uniformity, deposition rate, and epitaxial crystallinity. The model-specific features increase stability and repeatability of the processing and realize lower cost of ownership, while maintaining strict process control. The internal liquid cooled cooling shield protects the user from radiation and noise during the deposition process. AMAT / APPLIED MATERIALS 7710A reactor is suitable for reliable growth of high-quality materials on a large variety of substrate materials using the CVD technology. This tool will offer precise process control, excellent defectivity, increased throughput, and high-yields. By utilizing the CVD method, this reactor can be used to create materials for a diverse range of applications, such as the manufacture of optoelectronic, magnetic, display and memory devices.