Used AMAT / APPLIED MATERIALS 7800 #79682 for sale

AMAT / APPLIED MATERIALS 7800 is an industrial reactor used to create semiconductors and other intricate integrated circuits. It enables users to take a material and manipulate it on the atomic level to create various components of integrated circuits. AMAT 7800 utilizes a chemical vapor deposition (CVD) process to deposit layers of material onto the substrate. A carrier gas, such as hydrogen, is introduced into the reactor along with reagents such as silane, ammonia, and acetylene. This creates a vapor that is then deposited onto the substrate in layers. The deposition rate and thickness of the layer is controlled by adjusting the temperature, pressure, and carrier gas flow rate. The controller of APPLIED MATERIALS 7800 monitors real-time temperatures and pressures of the process and enables users to monitor various pieces of data. The in-situ spectroscopy gives users additional insight into the vapor growth and helps ensure optimal deposition. 7800 also incorporates plasma processing to create a variety of different forms of layers, such as silicon nitride or silicon oxide. The plasma is created by applying RF power to the substrate, which breaks down the vapor and creates the appropriate layers. Additionally, the technology enables the doping of substrate materials with elements like phosphorus or arsenic. Overall, AMAT / APPLIED MATERIALS 7800 is an extremely advanced reactor that due to its high degree of precision allows for the fabrication of intricate components for integrated circuits. Its use of CVD, plasma processing, and in-situ spectroscopy enable users to create high quality layers with accuracy and uniformity. It's a highly reliable system that ensures consistent results regardless of the substrate material or application.