Used AMAT / APPLIED MATERIALS 7810 RP #69375 for sale

AMAT / APPLIED MATERIALS 7810 RP Reactor is an advanced chemical vapor deposition (CVD) equipment used to deposit thin films of various materials on substrates. The reactor is designed to facilitate high precision, production quality thin film fabrication with a wide repertoire of materials such as metals, carbides, fluorides, nitrides, oxides, and composite semiconductor compounds. AMAT 7810 RP Reactor's primary feature is the ease of operation and maintenance. It comes with a user-friendly interface and a number of automated features that simplify processes like recipe steps, pressure control, temperature control, and mass flow control. Additionally, the system features an in-situ gas cleaning unit which minimizes substrate contamination. APPLIED MATERIALS 7810 RP Reactor offers an exceptional amount of versatility due to its flexible process chamber design. It can accommodate a wide range of materials, including nanomaterials and substrate sizes from inches to micrometers. Moreover, its modular design allows for upgrading the reactor during an individual process cycle, making it well suited for continuous process improvements and for rapid prototyping. The reactor features two separate reaction chambers - a single chamber process machine and a dual chamber process tool. The single chamber process asset is designed for monolayer deposition, while the dual chamber process model is designed for deposition of multi-layer structures. In both configurations, the reactor has a large load-lock chamber, a low pressure load-lock chamber, and a vacuum chamber. The reactor also offers precision thermal control from room temperature to over 1000 °C. 7810 RP Reactor is equipped with high-sensitivity temperature, pressure, and flow meters, in addition to an advanced PLC controller for precise and automated process control. The equipment also has Endura monitoring software with full data logging and reporting capabilities that allows users to closely monitor ongoing processes. Additionally, the reactor's modular design offers heat extraction and heat recovery options, enabling process optimization and cost savings. In conclusion, AMAT / APPLIED MATERIALS 7810 RP Reactor is a reliable, user-friendly thin-film deposition system that offers a wide range of materials and substrate configurations. Its advanced control systems and automated processes reduce the need for operator intervention, while its extensive monitoring capabilities enable users to closely track ongoing processes. The unit also offers flexibility due to its modular design and heat recovery options, making it an ideal choice for high precision thin-film fabrication.