Used AMAT / APPLIED MATERIALS 7810 RP #9804 for sale

AMAT / APPLIED MATERIALS 7810 RP (Rapid Processing) reactor is an innovative batch-type reactor used for rapid semiconductor wafer processing. It is designed for front-end wafer fabrication and fabrication process development. The equipment features a semi-automatic, continuous-load cassette-to-cassette process that accommodates up to 240 150mm or 150 200mm wafers per batch. The discrete process components, such as batch loader/unloader, furnace, shutters, and coolers are modularly configurable and can be combined to match the user's precise process requirements. The system is equipped with AMAT full suite of wafer processing tools including advanced wafer cleaning systems and a precise, high-speed wafer centering unit that reduces wafer loading/unloading times. It also features an in-situ particle measuring machine that enables rapid analysis of wafer cleans. AMAT 7810 RP is designed for precise temperature control and precise process control. The tool utilizes PID control functions to provide a consistent temperature profile along the furnace zone and precise control of reactant addition. It also features a rapid heating controller that reduces wafer transition times and allows for increased throughput. The advanced control asset provides process parameters (temperature and reactant concentrations) that are automatically saved and can be used for process repeatability and development. The model also provides comprehensive, real-time data tracking, allowing process engineers to monitor and regulate the process. APPLIED MATERIALS 7810 RP is an advanced processing tool that is essential for efficient and high-yield semiconductor processing. With its easy to use interface and precise control, it is ideal for both high-volume and high-quality process development.