Used AMAT / APPLIED MATERIALS 7810 #293827237 for sale

AMAT / APPLIED MATERIALS 7810 Reactor is a high-performance deposition equipment designed to deposit high-quality thin films on large silicon substrates. It utilizes plasma-enhanced chemical vapor deposition (PECVD) to allow manufactures to deposit layers of SiO2, SiCN and other dielectric materials onto silicon, quartz, or metal surfaces. AMAT 7810 can achieve 10nm line widths with near-atomic-level precision. The system is flexible enough to deposit large amounts of material at high rates or to deposit very thin layers with total uniformity. APPLIED MATERIALS 7810 Reactor is configured as an integrated processing chamber and contains a 120-cubic-centimeter process chamber with three independently configurable source modules. The source modules provide plasmas of reactant gases to induce and control deposition. This deposition unit can also be used to sputter-etch, develop and anneal. The chamber is divided into two distinct metrology compartments, each with an independent set of control parameters. 7810 also has an integrated online mass spectrometer, enabling more accurate control of reactant gas composition. AMAT / APPLIED MATERIALS 7810 Reactor utilizes a radiant heatsink to efficiently dissipate thermal energy, and a parallel plate electrostatic chuck with RF deflection plates to maintain planarized substrates. The machine is enclosed in a stainless steel framework, assuring a smooth and consistent vacuum operation. AMAT 7810 Reactor has a high power density, thus allowing deposition and etching of large substrates at high temperatures and with shorter cycle times. APPLIED MATERIALS 7810 Reactor provides improved performance with an optimized process controller, allowing the user to set up multiple recipes and process sequences quickly. The tool is capable of controlling the process parameters with micron-level precision, and can achieve an incredibly high throughput with minimal operator intervention. Overall, 7810 Reactor is an extremely powerful, versatile, low-maintenance and cost-effective deposition tool for semiconductor device fabrication. Its precision and capabilities make it perfectly suited for a wide range of applications, including flat panel displays, memory devices and optoelectronic components.