Used AMAT / APPLIED MATERIALS 7810 #9077262 for sale

AMAT / APPLIED MATERIALS 7810 is an advanced CVD reactor designed for process capabilities in a wide range of applications. The advanced plasma-enhanced chemical vapor deposition equipment is a high-yield, high-performance process tool for the deposition of very thin films for advanced device technologies. AMAT 7810 reactor is designed for low consumable costs, providing a low cost-at-performance ratio. The system can be configured as a single wafer or batch process, as well as a broad array of in-situ metrology systems. It is equipped with both a single wafer electrostatic chuck, or a multiprocess chamber to enable advanced batch and single wafer processes. APPLIED MATERIALS 7810 reactor also features advanced plasma source technology, including the Plasma Enhanced CVD (PECVD) source. This technology allows for process control over temperature, ion concentration, ion flux and flux profile, among other deposition parameters. 7810 substrate holder holds up to six 12-inch silicon wafers with a single load and includes a wafer rotation device and a central vacuum port. The wafer rotation device is linked to an integrated controller, which provides positional precision and accuracy, enabling precise placement of the wafer during deposition. The reactor is also integrated with a closed loop wafer temperature control unit to maintain constant wafer temperature during processes. AMAT / APPLIED MATERIALS 7810 reactor has an advanced in-situ monitoring machine which can provide real-time monitoring of the deposition process. The integrated cool-down feature and in-situ monitor allow for rapid cycle time and process optimization. AMAT 7810's advanced monitoring and cooling features also provide precise control of deposition rates and layer thickness, leading to higher yield and improved process result. In addition to its advanced tool features, APPLIED MATERIALS 7810 also provides advanced safety and maintenance control systems. A gas pressure control asset ensures safety and accuracy, and a proprietary closed loop in situ pressure monitor ensures uninterrupted and efficient operation. 7810 also has a modular design for easy maintenance and upgrades. Overall, AMAT / APPLIED MATERIALS 7810 is an advanced CVD reactor designed for superior process capabilities for a wide range of applications. Thanks to its advanced monitoring and cooling systems, low consumable charges, precise process control, and low cost-at-performance ratio, AMAT 7810 is an excellent choice for advanced device and technology manufacturing.