Used AMAT / APPLIED MATERIALS 7810 #9258176 for sale

AMAT / APPLIED MATERIALS 7810
ID: 9258176
EPI Reactor.
AMAT / APPLIED MATERIALS 7810 is a type of deposition reactor used for the deposition of thin film materials. The reactor chamber is equipped with an argon-filled plasma source for clean and low-temperature processing. The reactor is equipped with an electron cyclotron resonance (ECR) source that helps produce higher quality coatings than those produced by other types of deposition systems. The reactor is designed to be highly efficient, with the latest technology and cutting-edge design features. The chamber can accommodate multiple wafer sizes up to 200 mm diameter. AMAT 7810 provides a wide range of deposition parameters including gas flows, total pressure, desired target temperature, substrate temperature, source power, bias power, and heating power. This is important for the production of thin film materials for a variety of applications in the electronics, energy, optics, RF/wireless and biomedical fields. The large chamber and high temperature capability allow for large-scale deposits in a single run. The equipment also comes with a personal computer-based operator interface, allowing for easy setup and operation. The system includes complete materials library software and enables the user to select the best deposition parameters for the current process. The library includes data for all different types of materials including metals, magnetics, semiconductors, dielectrics, and ceramics. APPLIED MATERIALS 7810 also features a dry-to-dry transport unit, enabling batch processing operations, as well as an integrated load-lock and pumping station that allows load and unload of up to 17 wafers. The machine is equipped with an autosampler that simplifies process control and gas flow. 7810 is designed to meet the requirements of both production and research. The high availability of the components, the ease of operation, the precision and accuracy of the deposits, and the reliability of the tool in production are some of its advantages. The $AMAT / APPLIED MATERIALS 7810 is considered one of the top-of-the-line thin film deposition systems on the market.
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