Used AMAT / APPLIED MATERIALS 8130 #9364855 for sale

AMAT / APPLIED MATERIALS 8130 is an advanced, high-performance, and cost-effective chemical vapor deposition reactor used for processing 3D NAND and other circuit formation processes. Using a vertical orientation, AMAT 8130 is capable of depositing uniformly thick, uniformity-controlled layers on substrates up to 200mm in diameter. With modular, tool-agnostic design, APPLIED MATERIALS 8130 can be used for a range of different deposition processes. 8130 is a single-wafer reactor designed with an advanced mechanical design that delivers fast and reliable performance. The mechanical design allows for quick and easy maintenance, as well as an expanded process window. The large, multi-zone loading/unloading station provides tight control over temperature, flow, and pressure to deliver uniform deposition. Additionally, there are four independent process chambers, each with its own heating element capable of baking up to 630°CI/250°C. The independent heating elements enable improved substrate process uniformity and have been tested to maintain a uniform temperature of ±2°C. In addition, AMAT / APPLIED MATERIALS 8130 is equipped with an advanced vacuum control equipment that allows for a range of process pressures and effectively removes reactant gases. The system consists of a digital pressure controller, which maintains the required process pressure, and a turbo-molecular pump that provides a fast, reliable, and stable vacuum, resulting in improved delivery of reactant gases and improved process control. An integrated motion unit, controlled by the reactor's robotic interface, automates the loading/unloading of substrates and allows for quick and easy transfer between the four reaction chambers. Furthermore, the integrated motion machine simplifies maintenance and reduces downtime. The tool also allows for precise control of substrate positioning and process temperature, enabling improved process uniformity. AMAT 8130 is an advanced, high-performance, and cost-effective chemical vapor deposition reactor designed to deliver improved deposition process uniformity and performance. With its modular, tool-agnostic design, APPLIED MATERIALS 8130 can be used for a variety of circuit formation processes used in the production of 3D NAND and other advanced integrated circuits. Its integrated motion asset, along with the digital pressure controller and turbo-molecular pump, grants the reactor improved process control and a greater level of accuracy. With the ability to bake up to 630°C in an atmosphere of ±2°C, 8130 is well suited for high-precision deposition processes.