Used AMAT / APPLIED MATERIALS 9240-03211 #293635674 for sale

AMAT / APPLIED MATERIALS 9240-03211 reactor is a high-performance CVD deposition tool designed for high-precision applications. This equipment is capable of producing exceptionally strong, uniform films while controlling microstructure and film morphology. The reactor is equipped with a vacuum chamber, robust gas delivery system, and powered heating element. This combination of elements enables it to operate at high pressure and temperature, providing uniform films with repeatable properties over large areas. AMAT 9240-03211 reactor chamber is constructed of nickel-coated stainless steel and includes a platen and rotating door. The platen is the re-entrant of the chamber where the substrates and targets are mounted. The rotating door at the entry port allows easy access of substrates in and out of the deposition chamber. The interior of the chamber is designed with a low profile configuration to allow for high-resolution uniformity and repeatable results. The reactor is equipped with a gas delivery unit that provides precise control of gas flow rate, mixing, and timing in order to ensure uniform film deposition over the entire substrate. This machine is comprised of an Edwards E2M18 vacuum pump, a series of mass flow controllers (MFCs), and a manifold equipped with valves for routing gas to various parts of the deposition chamber. By controlling the gas flow and composition, the reactor is capable of producing high-quality films with uniformity and repeatability. APPLIED MATERIALS 9240-03211 reactor also includes a controlled-atmosphere chamber that is equipped with a heating element regulated by a Central Processing Unit (CPU). This heating element is capable of producing temperatures up to 1000°C and pressures up to 200 Torr. The high-temperature and high-pressure environment created by the heating element promotes uniform deposition of films across the entire substrate. 9240-03211 reactor is a reliable tool for producing high-quality films, and its features make it ideal for a wide range of high-precision CVD applications. With its temperature and pressure control, precise gas delivery tool, and robust chamber design, this asset is capable of producing uniform films with repeatable results to meet the needs of demanding applications.