Used AMAT / APPLIED MATERIALS 9240-03211 #293648591 for sale

AMAT / APPLIED MATERIALS 9240-03211 reactor is designed to provide an optimal environment for a variety of semiconductor fabrication processes, most notably chemical vapor deposition (CVD). It features a temperature controlled vacuum chamber with a stainless steel perimeter and base plate, arc resistant quartz windows, and a ceramic substrate holder. The chamber has an internal volume of approximately 25 liters and a vacuum range of 1.0 x 10^-6 Torr. The chamber is equipped with a fast-pumping-out Turbo-Molecular Vacuum Pump and a Tecator TM2500 Mass Flow Controller to control the flow of gases. In addition, the chamber has two Load-Locks with an automatic opening/closing feature and a wafer basket for front-loading. AMAT 9240-03211 is capable of temperatures as low as -12° C and up to 800° C. The reactor is also equipped with an inner mini-shower, RF plasma generator, and double-loop cooling system for precise temperature control. APPLIED MATERIALS 9240-03211 is an excellent tool for producing high quality semiconductor device structures. It is capable of producing metal silicides, high dielectric constantsGate Dielectrics and vacuum deposited metal layers with precise doping patterns. Its precise temperature control and nitride deposition features offer precise control over the structure and composition of the devices being produced. The automated temperature control system is designed to optimize maximum thickness uniformity and feature resolution. Additionally, its rapid cycle frequency along with minimal thermal stress provide enhanced precision. 9240-03211 is user friendly with a touchscreen interface providing an intuitive control system. It comes with customizable recipes, a multi-language interface, and a remote operation feature. AMAT / APPLIED MATERIALS 9240-03211 also has safety features including an Over-Pressure interlock and a Dry Gas Pressure Switch. Additionally, the reactor has an ionized vacuum gauge to provide users with accurate chamber readings, and an Diagnostic Tool for error detection and preventive maintenance. Overall, AMAT 9240-03211 reactor is an excellent tool for producing high quality and precise semiconductor device structures. Its advanced temperature control and automated processes make it ideal for a wide range of CVD processes. It offers a user-friendly interface, customizable recipes, and a variety of safety features for greater accuracy and control in semiconductor manufacturing.