Used AMAT / APPLIED MATERIALS AE Minos chamber for Centura DPS II #293650481 for sale

AMAT AE Minos DPS II Chamber is a high-performance plasma-enhanced chemical vapor deposition (PECVD) reactor designed for manufacturing semiconductor devices. The AE Minos DPS II enables robust, highly repeatable processing of thin-film materials used in semiconductor devices. The chamber provides advanced uniformity control, rapid deposition rates, and high throughput. The AE Minos DPS II features a flat, square-shaped process chamber for uniformity and improved wafer-to-wafer repeatability. This chamber is outfitted with advanced, three-point uniformity control, allowing operators to monitor and adjust parameters to improve uniformity of the thin-film deposition. The chamber is also equipped with a high-performance plasma system, which provides enhanced and stable uniformity. This system also includes a 3-zone bias control to help reduce reactive ion erosion. The AE Minos DPS II incorporates a flexible deposition architecture, allowing operators to scale up or scale down the chamber's throughput and deposition rate. The chamber offers advanced process flexibility and an ability to deposit a wide range of thin-film materials with varying deposition processes. Additionally, the chamber can process a variety of substrates, including silicon, gallium arsenide, indium phosphide, and other compounds and oxides. The AE Minos DPS II is equipped with a number of advanced process control and monitoring systems, including edge detection, uniformity control, automatic temperature control, and load-lock. The AE Minos DPS II also features an advanced cooling and heating system for controlling temperatures in the chamber during processing, which ensures uniform and consistent deposition. The AE Minos DPS II is engineered for maximum productivity and to facilitate rapid, accurate thin-film deposition. With its flexible architecture, advanced process control, and high throughput, the AE Minos DPS II enables efficient and high-performance processing of a wide range of semiconductor films and substrates.