Used AMAT / APPLIED MATERIALS / AKT 1600A #293615967 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom


Sold
ID: 293615967
Vintage: 1999
PECVD System
Glass size: 370 x 470 mm
4 Channels
TM-CH
Regulator box
Control panel
Index
Monitor table
Pump rack
Dry pump (L/L)
Dry pump (T/M)
Remote frame
Scrubber
Missing parts:
Pump 4 Channels
Susceptor4 Channels
1999 vintage.
AKT/AMAT / APPLIED MATERIALS / AKT 1600A is an innovative and highly reliable vertical dry etch reactor. It is used to perform dry etching processes such as plasma etching, plasma ashing, and carbon film etching for a variety of semiconductor materials including silicon (Si), gallium arsenide (GaAs), and other compound materials. The reactor is designed to perform high-aspect-ratio etching, with high selectivity and uniformity. AMAT/AKT 1600A offers an important combination of features, including a wide process range, a large process chamber, advanced motion control and speed, and superior patterning capabilities. The reactor is equipped with a high-resolution time-of-flight etching which enables precise control over the ion beam in varying etch processes. The advanced digital control logic and multiple exhaust configurations offer a wide range of processes covering the etch depth, etch rate, and selectivity requirements. AMAT 1600A offers an exceptional degree of process reproducibility and low-cost-of-ownership. A built-in programmable controller, based on the latest Digital IGBT technology, ensures superior control over the process parameters. The reactor is also equipped with a Z-stepper motor and a Rotocage for advanced motion control. The on-board controller includes two-point test feature for verification of etch rate, selectivity, and uniformity. APPLIED MATERIALS/1600A reactor offers outstanding design features, performance, and cost-effectiveness. It is an industry leading etch reactor for the high-precision processing of a variety of semiconductor materials. Its superior patterning, reproducibility, and selectivity capabilities make it an ideal choice for etching tasks in semiconductor fabrication. Its advanced digital control logic and multiple exhaust configurations make it ideal for optimizing ion beam processes. In short, APPLIED MATERIALS 1600A is an advanced reactor designed to provide superior etch performance, cost-efficiency, and superior process capabilities.
There are no reviews yet