Used AMAT / APPLIED MATERIALS / AKT 1600A #293620423 for sale

AMAT / APPLIED MATERIALS / AKT 1600A is an advanced plasma-enhanced chemical vapor deposition reactor designed for the synthesis of thin film materials. The reactor is equipped with several features that make it an ideal choice for thin-film deposition processes in research and development, production, and prototyping operations. AKT 1600A features a plasma generating equipment that uses both RF and microwave power to ionize the plasma gas, allowing for improved uniformity in plasma etching. This system provides an efficient means of configuring the reactor's RF power and gas control systems, while optimizing plasma parameters. The reactor also offers excellent temperature control through a high-performance cooling unit, enabling precise adjustment of process temperatures. The reactor also has a software-based machine that allows users to quickly and easily program operating parameters including pressure, temperature, and RF power level. This tool offers real-time monitoring of critical parameters, as well as data logging capabilities that enable process tracking and optimization. AMAT 1600A consists of a vacuum chamber, a low pressure plasma source, and a controller. The vacuum chamber provides an inert environment for material processing and is outfitted with an anodized titanium liner for enhanced uniformity. The low pressure plasma source uses microwave energy to generate a highly energetic plasma that provides uniformity in thin film deposition. The controller allows for precise control over process parameters, enabling operation within predetermined ranges for optimal efficiency and results. 1600A is an excellent choice for users requiring enhanced thin-film deposition capabilities. With its combination of power and precision, this reactor is ideal for processing a range of materials and substrates. Moreover, its versatile design and intuitive operation make it an excellent choice for researchers, developers, and production facilities.