Used AMAT / APPLIED MATERIALS / AKT 1600A #9196910 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom


Sold
ID: 9196910
Wafer Size: 2"
Vintage: 1999
PECVD System, 2"
Glass size: 370 X 470 mm
TM Chamber
A/B/C/D Chambers
MFC Box
Regulator box
Main frame
Control panel
Index
Monitor table
Pump rack
Dry pump 1 (L/L)
Dry pump 2 (T/M)
Remote frame
Main scrubber
Missing parts:
(4) Chambers pump
Suspector (4) Chambers
1999 vintage.
AMAT / APPLIED MATERIALS / AKT 1600A is a high-end research and development reactor designed for atomic layer deposition (ALD) and plasma enhanced chemical vapor deposition (PECVD). This single-wafer reactor is capable of precisely and controllably depositing extremely thin films of only a few nanometers thick, making it ideal for device manufacturing and nanotechnology research. AKT 1600A's chamber measures 200 mm in diameter and is capable of handling substrates with a range of temperatures from 50°C to 800°C and pressures from 0.5 to 200 mTorr. It is also compatible with a variety of atmospheres and flows, including nitrogen, sulfur hexafluoride, and argon/oxygen. The reactor is designed for ease of use and simple calibration. It has six sample lift positions and can also be used to collect side profiles for further analysis. These features combine to give users precise control over deposition rates and uniformity. The power source on AMAT 1600A is a 2.75kW RF generator; a very effective source of power for their range of applications. This generator provides a wide range of operating frequencies from 1 kHz to 1 MHz. It is equipped with advanced software that allows users to adjust settings such as frequency, power, and bias. The 1600AL offers advanced temperature control and monitoring features as well, allowing users to set and monitor temperatures to within 0.2 °C. This is ideal for applications that require very precise temperatures in order to achieve desired results. Finally, APPLIED MATERIALS 1600A is equipped with an automated cleaning system in order to maintain the highest levels of cleanliness in the chamber. This system helps ensure that the reactor's performance levels remain uncompromised over time. All of these features make 1600A one of the most popular and reliable research and development reactors on the market today. The reactor has become the go-to choice for many advanced materials research and device manufacturing applications. .
There are no reviews yet