Used AMAT / APPLIED MATERIALS AKT-25K #293604834 for sale

AMAT / APPLIED MATERIALS AKT-25K is an advanced, high-performance vertical plasma reactive ion etch (RIE) reactor that is designed for use in semiconductor production processes. This advanced system is capable of providing a clean and high-quality process uniformity and critical dimension (CD) control. It has been optimized for increased production yields and improved etch rate uniformity. AMAT AKT-25K supports a wide variety of materials, including ceramic, metals and oxides, and can be used in vapor phase or in liquid processes. The system has been optimized for high speed and accuracy, with accelerator control and process robustness. It is also designed for easy integration with other systems and processes. APPLIED MATERIALS AKT-25K's high-speed vertical architecture enables it to support high throughput applications, with a process chamber that can process up to 4 wafers in parallel. The vertical layout offers shorter transport times that help maintain process uniformity and reduce potential for damage caused by wafer-to-wafer collisions. AKT-25K is powered by an advanced power source, which can be configured to optimize process quality and power efficiency, allowing for precise processing of a variety of materials and a wide range of processes. It also includes multiple gas control systems, allowing users to easily control multiple processes. AMAT / APPLIED MATERIALS AKT-25K includes a host of safety features, such as ground fault, gas leak and arc detection, to protect against process damage, interlock systems to prevent accidental cross-communication and enable easy integration, and automatic wafer unload protection. It also features a user-friendly GUI that enables users to set up and manage complex process recipes quickly and easily. Overall, AMAT AKT-25K is an advanced, high-performance reactor designed for use in semiconductor production applications. It offers a robust process through an optimized power source and gas control systems, safety features, and user-friendly GUI. Its advanced vertical architecture allows for quick and accurate processing of a wide variety of materials, and its process throughput capabilities make it ideal for high-throughput applications.