Used AMAT / APPLIED MATERIALS / AKT 4300 / 5500 #293661852 for sale

AMAT / APPLIED MATERIALS / AKT 4300 / 5500 reactor is a high-temperature chemical vapor deposition (CVD) reactor suitable for commercial scale production of semiconductors, optoelectronics and other electronic components. This reactor is designed to deposit a wide range of film materials, such as diamond-like carbon, silicon nitride, and silicon carbide, on substrates including silicon, gallium arsenide, and sapphire. AKT 4300 / 5500 reactor utilizes a hot-wall design, with radio frequency (RF) induction heating and digital temperature control to create the desired process temperatures. AMAT 4300 / 5500 reactor can achieve temperatures up to 1,250°C, which are necessary for certain types of film deposition processes. This capability is enabled by a closed-loop gas control system and inductively coupled RF plasma that deliver stable, uniform temperatures throughout the reaction chamber. The large, cylindrical reaction chamber of 4300 / 5500 reactor can process substrates up to 350 mm in diameter, enabling the fabrication of large-scale components. The advanced rotor/stator pumping system offers a maximum pumping speed of 8,000 l/min, and can be used in combination with a hydrogen or argon partial pressure technique to create the precise chemical environment needed for certain types of film deposition. APPLIED MATERIALS 4300 / 5500 reactor also features an optional two-door cold wall for additional processing flexibility. This feature enables customers to switch between thermal and non-thermal processes without loss of vacuum, providing great flexibility in sample loading and processing. Additionally, AMAT / APPLIED MATERIALS / AKT 4300 / 5500 reactor offers comprehensive digital process control, which allows for easy programming and optimization of deposition recipes. This reactor is equipped with an Easy-LANG language for setting up, monitoring, and verifying all process steps, as well as for duplication of complex deposition runs. AKT 4300 / 5500 reactor can be used for a variety of research and production applications, including the deposition of semiconductor and organic layers, precipitation of dielectrics and metals, nanocrystals, and nanowires. This reactor offers superior performance and reliability, with a high-voltage RF source and advanced process monitoring features that allow researchers to achieve outstanding results. AMAT 4300 / 5500 reactor is an ideal solution for commercial applications requiring high-temperature CVD processes.