Used AMAT / APPLIED MATERIALS / AKT 4300 #9383296 for sale

AMAT / APPLIED MATERIALS / AKT 4300 is a plasma etch and deposition reactor with a horizontally-oriented, single-wafer process chamber. It is capable of performing etch, deposition, and high-density plasma (HDP) processes at high throughput, with excellent repeatability and process control. AKT 4300 is a production-ready reactor that has the capability of performing a wide range of process applications, such as single and multiple-step etch and deposition processes. It employs a variety of process gases including helium, nitrogen, argon, and chlorine based gases. An advanced gas control equipment ensures precise and repeatable plasma chemistry control throughout the process chamber. The reactor utilizes state-of-the-art plasma generation, monitoring, and control technologies. The magnetic plasma confinement system enables excellent process uniformity and control, while the advanced wafer motion control unit ensures accurate wafer transport and processing. The integrated process control machine automatically adjusts parameters in response to changing conditions. The reactor utilizes an advanced PECVD process that supports high-end Si and SiGe doping for harsh plasma etch and high-density plasma (HDP) applications. It also has the ability to operate in parallel, mapping RIE with shallow trench isolation (STI) applications. The reactor is equipped with an in situ capacitively coupled plasma (CCP) source that provides excellent process performance. The reactor can withstand high temperatures and pressure, and is designed for 24/7 operation in high-volume production environments. It can accommodate wafers up to 8" in diameter and processes them at up to 200 W/cm. It also incorporates advanced vacuum and pressure control systems to ensure repeatable, trouble-free operation. AMAT 4300 is a highly versatile reactor that meets the needs of advanced device fabrication. Its ability to etch and deposit with varying chemistries provides excellent process capability, enabling users to develop and refine a wide variety of device structures and processes. Thanks to its sophisticated design and advanced process control tool, 4300 can provide improved throughput, repeatability, and process control for advanced device fabrication.