Used AMAT/ APPLIED MATERIALS AKT-5500 #293821004 for sale

AMAT / APPLIED MATERIALS AKT-5500 is a high-tech reactor designed for the purpose of advanced deposition processes. It is mainly used to deposit thin films onto various substrates including semiconductor materials, dielectrics, and glasses. AMAT/APPILED MATERIALS AMAT AKT-5500 reactor features a triple-zone design. This multiple chamber system provides easy access to all areas that are critical for the deposition process. It also features high temperature operation capability and the ability to produce extremely uniform films. The triple-zone design of APPLIED MATERIALS 5500 ensures a superior deposition process. The three chambers consist of a pre-heating chamber (plasma) at temperatures up to 200-300°C, a substrate heating chamber (plasma) at temperatures up to 1300°C, and a post-deposition high-frequency chamber (RF) at temperatures up to 850°C. The combination of the three chambers enables the reactor to operate with either low or high temperatures through the entire deposition process. Additionally, the high temperature operation capability ensures that extremely thin, uniform films can be deposited on to a substrate. 5500 reactor also offers precise control of the overall process. It features a computer-based control system that provides feedback regarding the deposition process. This feedback can be used to adjust the system and ensure that all components are working efficiently. Furthermore, it also comes with a hexapole aligned-guide allowing for multiple gas inlets and ensuring optimal uniformity of the film across the entire surface area. Overall, AKT-5500 is an innovative and reliable reactor with a triple-zone design for high temperature operations. It is capable of precise control ensuring thin and uniform films and is perfect for advanced deposition processes. Its efficient design and overall performance make it an ideal choice for those looking for a reliable and efficient deposition process.