Used AMAT / APPLIED MATERIALS Endura II #9176408 for sale

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ID: 9176408
Wafer Size: 12"
Vintage: 2011
RF Etcher, 12" Software OS: Window SMIF Type: Non-SMIF Wafer of type: Notch at 6 o' clock Chuck: Pin 2011 vintage.
AMAT / APPLIED MATERIALS / AKT Endura II is a plasma-enhanced chemical vapor deposition (PECVD) reactor designed for advanced materials and process research. The reactor provides superior process flexibility and high performance capabilities for the deposition of advanced films, such as dielectrics, conducting polymers, barrier coatings, and adhesives. AKT Endura II is a hybrid thermal/ion processing equipment, capable of temperature range up to 700°C and ion current densities from 0.01 mA/cm2 to 0.1 A/cm2. This advanced system also incorporates a rotating diffuser plate for a fast production rate, as well as a low-pressure plasma source and high purity gas delivery unit for the deposition of precise materials layers. The primary features of AMAT Endura II include a high-speed RTM® pulsed-DC magnetron sputtering source, a midfrequency RF plasma-enhanced PECVD source, and an ion source. A 100 mm multi-chamber process module can be added to the machine to allow up to 10 users to conduct simultaneous experiments. This process module houses an automated substrate holder, temperature control, and vacuum tool. The Reactor has a high capacity load lock module for efficient sample loading and unloading, and features a rotatable pre-deposition wafer cleaning chamber for efficient substrate dry-cleaning. Endura II is an ideal platform for research and development of advanced materials, such as silicon-based semiconductors, graphene, ferroelectrics, and dielectrics. The features of the asset can be tailored to meet the specific requirements of the research project. APPLIED MATERIALS Endura II is equipped with a number of advanced process and safety features, such as process recipe creation and editing, multi-user access control, comprehensive model monitoring and logging, and integrated safety features to protect personnel and equipment. The equipment offers complete programmability, providing the user with full control over their process parameters. AMAT / APPLIED MATERIALS / AKT Endura II is an advanced PECVD reactor that provides superior process flexibility and high performance capabilities for advanced materials and process research. The Reactor features advanced plasma sources, a rotating diffuser plate for a fast production rate, and a low-pressure plasma source for precise materials deposition. The system also offers user-friendly operation, superior safety features, and full process programmability, allowing for exact control over the process parameters. AKT Endura II is an ideal platform for advanced materials and process research and development.
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