Used AMAT / APPLIED MATERIALS Endura II #9200861 for sale

AMAT / APPLIED MATERIALS / AKT Endura II is a reactor specifically designed for low cost semiconductor processing. It is a single-wafer-based batch reactor system designed to provide uniform deposition of advanced metals, alloys, oxides, and other material films onto a silicon or other substrate. It is a hot plate based vacuum deposition platform with customizable process parameters for advanced precision process control. The AKT Endura II reactor features a unique design with an adjustable height source positioned combined gas injector and substrate heater plate which allows for uniform deposition of materials and gases over large areas. It utilizes advanced technology to further distribute uniform thickness for consistent and precise processing. The built-in, ultra-high vacuum chamber helps to create pure deposition environments. Its dedicated controller allows for the fine-tuning of processing parameters, such as pressure, temperature, and flow rate, as well as accurately controlling the thickness and uniformity of the deposited layers. In operation, the reactor utilizes a radio frequency (RF) power supply to create the plasma of material for deposition. The plasma is created in an inductively coupled chamber and is then injected into the main processing chamber, where it is precisely deposited onto the substrate surface. The shower head, which is connected to the substrate chamber, helps to deliver the materials uniformly while simultaneously preventing any back-sputtering or debris formation. AMAT Endura II reactor is a versatile and reliable tool for production-level semiconductor processing. Its low-cost design makes it an economical choice for expanding operations without compromising quality. Additionally, its design allows for easy integration into existing manufacturing processes, making it a convenient solution for modern semiconductor fabrication.