Used AMAT / APPLIED MATERIALS ALD Chamber for Endura CL #293663271 for sale

AMAT Endura CL ALD Reactor is tailored to provide the highest quality and most precise atomic layer deposition (ALD) for applications in the semiconductor industry. This ALD chamber is designed to be as efficient and cost-effective as possible, and incorporates numerous advanced features which make it the ideal choice for creating reliable and consistent layers. The Endura CL Reactor has an enhanced design which provides a superior environment for deposition. Its' gold-plated interior and low-distance-to-pump structure increases deposition throughput and helps reduce undesirable reaction by-products. This chamber is equipped with an advanced web-based control system that allows for easy monitoring of process time, pressure, and temperature. In addition, its flow-fitting design is fully compatible with helium, nitrogen, and pure-hydrogen systems, ensuring it can be used by various processes without the need for additional infrastructure. The chamber also features a large panel view window and numerous ports for both gas and cooling management. The Endura CL Reactor is optimized for uniform precursors deposition, which creates uniform interfaces with a higher attainable factor for device performance. It also features a clean/dry precursor pathway, as well as quick-change wafer support and deposition stages. This chamber is designed to consistently deliver uniform ALD films with excellent step coverage, even on the most challenging substrates. As a piece of industrial machinery, the Endura CL Reactor is equipped with false-flooring chambers for substrate transfer and an isolation chamber. These provide a clean, interference-free environment for the chamber and help prevent the contamination of the substrates. Additionally, this machine also features a recessed substrate heater which allows for precise control over process temperatures and thereby helps maintain the accuracy of the ALD process. AMAT / APPLIED MATERIALS ALD Chamber for Endura CL is one of the most advanced ALD systems on the market. As such, it provides the highest quality and precision when creating different layers for use in the semiconductor industry. Thanks to it's advanced design and enhanced features, this ALD chamber is optimized for uniform and consistent ALD film deposition.