Used AMAT / APPLIED MATERIALS AMC-7700 #293666919 for sale

AMAT / APPLIED MATERIALS AMC-7700 reactor is a modular, computerized plasma etching equipment used for a variety of wafer etching processes. It is designed to be an affordable, reliable, and efficient means of fabricating electronic components that require the precise removal of material layers in order to reach the desired design requirements. The reactor is capable of processing materials such as glass, metals, ceramics, and plastics. AMAT AMC-7700 is equipped with a 3-phase power supply, multiple control boards, industrial-grade RF components, and a robust pressure and temperature control system. This combination of components allows for precise control of plasma parameters and cycling conditions for improved process reliability and yields. The unit is designed for both batch and single wafer processing. The machine's in-situ monitoring tool (ISM) is comprised of a pair of load-locked, loadable gas cells, in which the chamber pressure, temperature, and RF frequencies can be controlled. The ISM allows for real-time adjustments to chamber parameters to ensure optimal etch results. This also reduces the time required to set up and tool the asset for each process. The ISM is also used to detect the status and composition of the sample area, aiding in troubleshooting and maintenance. APPLIED MATERIALS AMC 7700 also offers a number of other support components, such as feature-driven etch rate control, multiple scan modes, multiple configurations, a highly configurable in-situ monitoring model, and a cyclic and rapid pulse mode. This array of features allows for flexibility during the etching process and can help to reduce process times. Additionally, the reactor is compatible with many existing and newer robotic handling systems to further improve the efficiency and the quality of the etching process. In summary, APPLIED MATERIALS AMC-7700 is a trusted, reliable, and cost-effective equipment for precision etching processes. Its array of features and components, such as the in-situ monitoring system, multiple scan modes, and feature-driven etching rate control, offers tremendous flexibility for the etch process. This robust unit is an invaluable asset to any semiconductor fabrication facility.