Used AMAT / APPLIED MATERIALS AMC 7810 #102168 for sale

AMAT / APPLIED MATERIALS AMC 7810 is an industrial reactor used for processes such as oxidation, stripping, and etching. This specific model is ideal for applications involving permanent and or volatile photoresists. AMAT AMC 7810 has a chamber with a manufactured volume of 0.3m3 and capable of temperatures up to 400°C. This chamber is sealed using a chamber sealing equipment constructed from stainless steel, KF components, electrical connections, and a 6" CF flange. Controlled pressure can be stabilized using a mechanical or electrical solution. The reactor includes a series of components used to sustain and control the gas flow and vacuum. The gas flow is managed by a gas source system, while the vacuum is managed by a diffusion pump controller. The reactor is usually controlled through a Computer Automated Process Control (CAPC) unit, which can be connected to a PC Programmable logic controller station. This machine is designed to monitor, detect, and restore the chamber operating parameters, such as temperature, pressure, flow rate, etc. APPLIED MATERIALS AMC 7810 also comes with a number of safety features, such as a safety over pressure tool, an exhaust valve, a vacuum interlock, and a pressure indicator. The reactor is designed to provide accurate and precise control of the etching process for photoresist removal. It offers an optimized solution for low and medium volume, process line etching, and wafer cleaning. It can also be used with a wide range of process chemistries, offering flexibility for different etching processes. Overall, AMC 7810 is an industrial-grade etching and gas flow reactor that is capable of reaching high temperatures and can be easily integrated into a process line. It provides precise control for etching processes, using a wide variety of process chemistries, reducing cycle time and increasing process efficiency.