Used AMAT / APPLIED MATERIALS AMC 7811 #9069030 for sale

AMAT / APPLIED MATERIALS AMC 7811
ID: 9069030
Epitaxial reactors.
AMAT / APPLIED MATERIALS AMC 7811 is a low pressure chemical vapor deposition (LPCVD) reactor designed for the production of high purity thin coatings, such as silicon nitride, polysilicon, silicon oxide, and tungsten. The reactor chamber is comprised of stainless steel and is rated for operation up to 1050°C depending on the process applications. With an internal volume ranging from 1.2 to 7.6 cubic feet, AMAT AMC 7811 is capable of accommodating up to 5 100mm substrates, 4 150mm or 2 200mm substrates. The reactor is equipped with a powerful wafer transport to quickly and precisely move substrates through the equipment. The transporter operates at a frequency of up to 10kHz providing for a rapid reaction time. The wafer transport is designed to work with a frequency modulated RF generator for accurate substrate positioning. APPLIED MATERIALS AMC-7811 also features a state-of-the-art process control system capable of monitoring and controlling important process parameters such as temperature, chamber pressure, flow, and humidity. Additionally, the unit offers advanced diagnostics capabilities for gas purity and wafer uniformity. These features ensure process repeatability for every substrate resulting in uniform coating thickness and structures. AMC 7811 was designed to meet the demanding requirements of manufacturers by providing efficient and high quality production processes. It provides uniformity and repeatability over a wide range of temperature and pressure, with uniformity better than ±1%. Additionally, the machine is capable of producing deposition rates as low as 10nm and deposit rates of up to 40 angstroms per second. AMAT AMC-7811 reactors offer a compact and reliable tool for research and production requirements. It is ideal for the production of thin layers and allows for easy maintenance and service with an intuitive Graphical User Interface (GUI). Furthermore, the asset is fully compatible with AMAT suite of process modules for further customization as desired by the user.
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