Used AMAT / APPLIED MATERIALS AMC 7811 #9293632 for sale

AMAT / APPLIED MATERIALS AMC 7811
ID: 9293632
Wafer Size: 6"
Vintage: 1990
Epitaxial reactor, 6" 1990 vintage.
AMAT / APPLIED MATERIALS AMC 7811 is a high performance plasma reactor designed for reactive ion etching (RIE) applications. It is a fully integrated equipment that offers precision and accuracy to a wide range of industrial processes. With the help of this reactor, users can perform etching operations in the easiest, quickest and most efficient manner. The core of AMAT AMC is a powerful and accurate rf power supply. It is designed with the latest technology to ensure the highest process quality and uniformity. It also provides a comprehensive data logging system for capturing process indicators such as temperatures, chamber pressures and wafer levels. The uniqueness of the power supply includes a variable frequency mode that makes it suitable for various RIE applications. In addition, AMAT AMC 7811 reactor is equipped with a specialized shutdown function. This feature allows the operator to instantly stop the etching process if an emergency situation arises. It also has a built-in timer, which automatically changes the process parameters according to a predefined sequence of steps. APPLIED MATERIALS AMC-7811 reactor features advanced cooling system designed to ensure the efficiency of the etching process. Moreover, it has a large processing chamber that can easily accommodate larger substrates. The chamber is also designed to ensure excellent operation and control. AMAT / APPLIED MATERIALS AMC-7811 is also equipped with a variety of advanced accessories such as gas monitors, sample holders, scrubber systems, etc. It is also provided with several user-friendly software packages that enable the users to set up, control and monitor their process in a more efficient manner. Overall, AMC 7811 is an advanced and reliable plasma etching solution for the industrial applications. It is designed for the highest precision and provides excellent performance in etching processes. The advanced features of the reactor even make it a highly desirable system for process automation.
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