Used AMAT / APPLIED MATERIALS AMC 7811 #9390647 for sale

AMAT / APPLIED MATERIALS AMC 7811 is a high-performance, general-purpose plasma reactor developed specifically for semiconductor industry. It is capable of performing a variety of processes, including etching, deposition, and cleaning. The 7811 has been designed to deliver precision results with minimal setup time and cost. This reactor offers a unified machine platform for continuous wafer processing that is suitable for both advanced development labs and production environments. It has been designed to be both robust and flexible, allowing it to be configured for a variety of tasks. The reactor features an active chamber volume of 4.6 m^3, making it capable of processing many wafers or substrates in a single batch. It also makes use of a dual frequency RF electrode design to achieve optimized etching results and reduce plasma center drift. This creates a uniform distribution of plasma across the chamber. The 7811 also incorporates an advanced gas delivery system with ultra-low flow switching technology and fast tuning features. This allows for instant switching between gases and settings, as well as greater processing flexibility. The reactor is also equipped with an advanced self-calibration system that enables precise process control and repeatability. In addition, this plasma reactor offers superior maintenance capabilities. It features an end-user accessible primary gas box and a quick-change, high-flow gas manifold. It also utilizes an air break system for safe and efficient service on the unit. AMAT AMC 7811 plasma reactor is a robust, highly capable machine suited to both complex R&D processes and production applications. It is designed to ensure top-quality results in a range of settings, even when the requirements are changing constantly.