Used AMAT / APPLIED MATERIALS AMC 7821 #9315234 for sale

AMAT / APPLIED MATERIALS AMC 7821 Reactor is a chemical engineering tool designed specifically for the growth of high-quality thin films. The reactor combines a dual-chamber, vertical-shaft design with a ceramic-constructed microfabrication chamber that enables highly-uniform growth of optically-active semiconductor layers. AMAT AMC 7821 Reactor is a state-of-the-art chemical vapor deposition (CVD) equipment that offers the user advanced features such as high homogeneity, low substrate contamination, precise temperature control, and low acoustic noise. The system operates at a pressure range of 1-5 Torr or atmospheric pressure, reaching temperatures up to 350°C. The dual-chamber setup of APPLIED MATERIALS AMC 7821 Reactor helps to maintain a highly pure environment. The upper chamber holds the susceptor and ceramic microfabrication chamber, and the lower chamber contains the exhaust and deposition chambers. Gas flow is organized by a central manifold with fine controls. The susceptor is an element which contains a graphite heating element and is mounted on a vertically-adjustable shaft. The adjustable shaft helps to accurately control the substrate's distance from the susceptor. The ceramic microfabrication chamber ensures efficient uniform growth of a film without contaminants. AMC 7821 Reactor's flexible design allows the user to select multiple process gas channels, depending on the material they are growing. The gases are injected through a centrally-mounted injector head and channeled to the reaction chamber via a tubular manifold. Reactive gas control is also provided to ensure accurate and uniform doping profiles, making it an ideal unit for optically-active layers. The exhaust and recovery machine of AMAT / APPLIED MATERIALS AMC 7821 Reactor includes a recyclable steel container that ensures quick and easy cleaning and disposal of contaminated materials. The recyclable container also facilitates collection of samples in a permanent, non-flammable environment for optical material analysis and characterization. Overall, AMAT AMC 7821 Reactor is a pioneering and versatile reactor that offers reliable and precise temperatures control, high homogeneity, low acoustic noise, and excellent uniformity of thin film deposition. The unrivaled quality of APPLIED MATERIALS AMC 7821 Reactor's components offers a rare level of reliability and performance, making it an ideal tool for a wide range of optically-active layer deposition tasks.