Used AMAT / APPLIED MATERIALS AMC 7821 #9390648 for sale

AMAT / APPLIED MATERIALS AMC 7821 is a plasma enhanced chemical vapor deposition (PECVD) reactor for use with thin film deposition applications. This equipment is designed for coating substrates with thin films of dielectric and non-dielectric materials, based on integrated process development and process control systems. AMAT AMC 7821 offers improved processing control over traditional thermal deposition techniques and an increased range of processes. The system is made up of an electrostatic chuck, two RF sources, an integrated turbo-pump, and an overall vacuum flange package. The electrostatic chuck is used to hold the processed sample in place, and allows for accurate control of the area to be processed and the shape of the substrate. The two RF sources are used to generate and control the energy for the deposition process, allowing for customized conditions depending on the process requirements. The integrated turbo-pump is used to achieve a low-pressure environment during thin-film deposition, and allows for a faster pump-down cycle. The FM-7821 is also equipped with a full user-defined automation package, including a variety of temperature and control settings. This allows for precise, repeatable processing conditions, and minimizes the risk of errors during the deposition process. The user-defined automation package also includes control of the process gas, such as gas mixing, flow rate, and partial pressure of the gases within the chamber. The reaction chamber is constructed with aluminum-coated and stainless steel, and utilizes an optimized bell-jar design to reduce the chances of flashover or arcing during the deposition process. The precision of this design allows for faster process cycles and improved uniformity and stability of the process, resulting in higher quality thin films. APPLIED MATERIALS AMC 7821 is designed for improved cost efficiency and environmental safety. It minimizes the required amount of materials and gases used for the process, allowing for reduced costs and improved safety. The unit also offers a range of safety sensors for monitoring of airborne particulates and other potential risks associated with plasma processing. In summary, AMC 7821 is a versatile PECVD reactor, providing efficient and reliable thin film deposition with excellent precision and repeatability for a variety of applications. The machine utilizes advanced user-defined automation packages to provide precise process control, and offers low cost and environmental safety by minimizing the required amount of process materials. It is an ideal tool for high-precision thin film deposition.