Used AMAT / APPLIED MATERIALS AMS 2100 #9024606 for sale

AMAT / APPLIED MATERIALS AMS 2100 is an advanced plasma reactor equipment for producing high quality integrated circuits. This system uses a combination of gases, oxygen, hydrogen and nitrogen, with thermally created plasma to deposit material on a substrate. The chamber of AMAT AMS 2100 contains a high power RF generator for creating the high energy plasma as well as a mechanical wafer chuck to hold the substrate during processing. The unit also has an auxillary power supply to control the temperature of the substrate wafer during processing. The machine design features a unique combination of etching and deposition capability that enables devices to be formed at the lowest possible cost with the highest yields. APPLIED MATERIALS AMS 2100's plasma process provides excellent step coverage in the narrowest of line-widths as well as high density dielectric layers and low surface roughness. Its low temperature annealing features ensure the highest quality material adhesion and superior device performance. The tool also offers high deposition rate with excellent dielectric uniformity capability and improved bottom coverage. The process can be used for deposition of copper, tungsten, and aluminum metallization as well as dielectric, insulating, and polymer films. AMS 2100 has an array of control features for providing high accuracy process control, including temperature, pressure, and flow control. The asset has a wide range of process recipe capabilities with user-defined parameters that can be optimized for specific applications. Flexible control features allow real-time tuning of parameters for optimum results while advanced features enable automatic optimization of the deposition environment. The reclosable chamber of AMAT / APPLIED MATERIALS AMS 2100 simplifies substrate exchange and minimizes contamination risks. The model also features rapid specimen loading and unloading without the need for a glove box, minimizing the risk of particle contamination and contamination of the environment. The process monitor is designed to monitor chamber pressure, temperature, and gas flows during production runs to ensure process integrity and quality. In conclusion, AMAT AMS 2100 is an advanced and versatile reactor equipment that can be used for the production of a wide variety of integrated circuit products. It offers excellent process control, automated optimization features, and a simplifed substrate exchange. Its superior step coverage and high deposition rate capabilities enable devices to be formed quickly and with high yields.