Used AMAT / APPLIED MATERIALS AMS 2100 #9269434 for sale

AMAT / APPLIED MATERIALS AMS 2100 is a widely used chemical vapour deposition (CVD) reactor, suitable for deposition of various thin-film materials. It provides high-performance, cost-efficient deposition over a wide range of growth conditions. The reactor has a maximum temperature of 2000°C, awesome power levels up to 5000 W and can process up to 2200 square inch of substrate. It has integrated safety features and can be operated manually or programmatically. AMAT AMS 2100 is engineered to provide uniform deposition over the entire surface of large-area substrates. It features a multi-zone heating platform with variable zones from 4 up to 10 depending on the configurations and can accommodate substrates as large as 12 inches in diameter or up to 2200 square inches. It comes with a vertical susceptor lift for fast substrate handling and can be supplied nitrogen, argon, silane, ammonia and other process gases for different deposition applications. The reactor employs a two-pump superior turbomolecular vacuum equipment, with a maximum base pressure of 3x10-7 Torr when a diffusion pump is used, providing excellent process control and uniformity. It features zoned pumping geometry and a unique gas flow path design to minimize gas phase residence time and conserve gas usage. The reactor also comes with advanced temperature controllers and dedicated safety systems for temperature, pressure, thermal stress, and gas overpressure. APPLIED MATERIALS AMS 2100 is also designed for safer operation and maintenance. It comes with integrated safety systems and programmed safety protocols to ensure safe operation. The reactor's control panel can be used for manual operation, including setting up growth parameters, monitoring process conditions, and shutting down the system. It also has a process control unit for programmatic operation, allowing for continuous and unattended growth. There are a variety of other features and options, all designed to make AMS 2100 CVD reactor a versatile and reliable machine for films deposition with superior properties for various applications.