Used AMAT / APPLIED MATERIALS BPSG Chamber for Producer SE #293631717 for sale
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ID: 293631717
Vintage: 2004
MKS Astron EX RPS
CLS208 Watlow controller
ALN Ceramic heater
1-1/8 C-Seal surface mount gas panel
0195-01042 AC Box
1080-00126 Heater lift driver
0190-13840 Pin lift driver
Manometer: 20T / 1000T
Pressure switch: 10 Torr
MKS 683B-31931 Throttle valve
NC 021010-1 ISO Valve
Process kit:
Top liner
Middle liner
Bottom liner
Pumping ring
Lift hoop
Gas panel:
Gas line / Gas / Size / MFC / Valve
1 / O3 / - / - / -
2 / O3 / - / - / Hamlet
3 / O2 / 30000 SCCM / UFC-8565C / Hamlet
7 / N2 / 30000 SCCM / UFC-8565C / Hamlet
8 / N2 / 30000 SCCM / UFC-8565C / Hamlet
9 / HE / 30000 SCCM / UFC-8565C / Hamlet
10 / N2-Purge / - / - / Hamlet
11 / N2-Purge / - / - / Hamlet
12 / NF3 / 5000 SCCM / UFC-8565 / Hamlet
13 / HE / 5000 SCCM / UFC-8565C / Hamlet
14 / AR / 15000 SCCM / UFC-8565 / Hamlet
Liquid 1 / - / - / - / TEPO
Liquid 2 / - / - / - / TEOS
Liquid 3 / - / - / - / TEPO
2004 vintage.
AMAT / APPLIED MATERIALS BPSG Chamber for Producer SE is a high-performance reactor system designed for the deposition of Borophosphosilicate Glass (BPSG) thin films in semiconductor manufacturing processes. This chamber is a critical component of AMAT Producer SE platform, which is a versatile and widely used system in the semiconductor industry for a range of thin film deposition applications. The BPSG chamber utilizes a unique combination of chemical precursors and process parameters to deposit BPSG films with excellent uniformity, purity, and film quality. BPSG films are commonly used as insulating layers in semiconductor devices to provide electrical isolation between different layers of the device and to planarize the device surface for subsequent processing steps. The chamber is equipped with advanced process control capabilities, including precise control of gas flow rates, temperature, pressure, and plasma parameters, to ensure tight control over the deposition process and achieve the desired film properties. The chamber also features a high degree of automation and integration with the Producer SE platform, allowing for seamless operation and efficient production workflows. One of the key advantages of APPLIED MATERIALS BPSG Chamber is its ability to deposit BPSG films with high film density, low impurity levels, and excellent step coverage on complex device structures. This is essential for ensuring the reliability and performance of semiconductor devices in demanding applications such as integrated circuits, memory devices, and sensors. The chamber is designed with a modular architecture that allows for easy maintenance, servicing, and upgradeability to meet evolving process requirements. It is equipped with state-of-the-art safety features, including gas monitoring and interlock systems, to ensure safe operation and minimize the risk of accidents in the cleanroom environment. AMAT / APPLIED MATERIALS BPSG Chamber is also designed with sustainability in mind, featuring energy-efficient components, waste minimization strategies, and compliance with environmental regulations. This aligns with the semiconductor industry's commitment to reducing its environmental footprint and adopting green manufacturing practices. In summary, AMAT BPSG Chamber for Producer SE is a highly advanced and reliable reactor system for the deposition of BPSG films in semiconductor manufacturing. Its cutting-edge technology, process control capabilities, and automation features make it an ideal choice for semiconductor manufacturers looking to achieve high-performance BPSG films for their devices.
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